研究了LTCC(低温共烧玻璃-陶瓷)N2气氛下基片排胶效果与铜布线质量.用综合热分析仪分析了LTCC基片N2烧结,发现有机物的排放集中在150~500℃区段;烧结试样微观断面形貌及能谱分析表明,干N2烧结后,基片中残留许多游离C,严重影响了基片强度及基片与Cu布线的界面结合;湿N2烧结后,基片排胶完全,但Cu布线发生了较为严重的氧化.
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