以Hf(SO_4)_2·4H_2O和HCl配制HfO_2前驱液,利用自组装单层膜技术,在OTS自组装单层膜的功能性基团表面制备晶态二氧化铪薄膜.研究了HfO_2前驱液的浓度,退火温度和有机硅烷单分子层等对HfO_2薄膜制备的影响.通过接触角测量仪,XRD和SEM等表征手段,对薄膜表面形貌、微观结构、物相组成进行分析.结果表明:基板在OTS溶液中浸泡为20 min时,有机层表面接触角最大为(110±2)°.利用自组装单层法成功制备出HfO_2晶态薄膜,HfO_2呈立方型,无其他杂相.膜层表面致密均一,生长良好.
An alkyl silane layers on the hydroxylated surface of the glass substrates were prepared via the method of self-assembled monolayers (SAMs); Hf(SO_4)_2·4H_2O and HCl were used as raw materials and HfO_2 thin films were prepared on the active groups of the alkyl silane by the liquid phase deposition(LPD). The surface morphologies and structures of the thin films were characterized and analyzed by water contact angle equipment, SEM and XRD. The results of the characterization indicate that the contact angle of OTS-SAMs displayed (110±2)° after immersing for 20 min. The HfO_2 thin films were prepared by the self-assembled monolayers, which were uniform and dense with a cubic microstructures of HfO_2. The concentration of reactants, calcining temperatures and SAMs play important roles on the growth of HfO_2 thin films.
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