采用俄罗斯UVN 0.5D2I离子束辅助电弧离子镀沉积设备,在高速钢W18Cr4V基材上沉积TiN膜层.研究了N离子束轰击能量对膜层表面形貌、相结构、显微硬度的影响.结果表明:N离子束辅助轰击,能够有效地减少和降低膜层表面"大颗粒"的数量和尺寸,消除了膜层中较软Ti_2N相,得到了单一的TiN相.随着轰击能量的增加,TiN相结构不发生改变,TiN(111)取向逐渐减弱,而(200)取向逐渐增强.N离子束辅助轰击能量的增加,提高了膜层的显微硬度.
TiN coatings were deposited on high-speed steel W18Cr4V substrate by Russia UVN 0.5D2I ion beam assisted arc ion plating. The effects of N ion beam bombarding on surface morphology, phase structure and micro hardness of deposited coatings were studied by change the energy of N ion beam bombarded. The experimental re-sults show that the size and the amount of large particles on coatings surface was decreased obviously, and unitary TiN phase was obtained and softer Ti_2 N phases were eliminated by N ion beam assisted bombard. As the energy of bombard increased, the phase structure of TiN didn't changed, however, TiN (111) crystal orientation gradually reduced, (200) gradually enhanced and the micro hardness of coatings reinforced too.
参考文献
| [1] | Jehn H A;Hofmann S;Ruckbotrn V E et al.Morphology and Properties of Sputtered (TiA1)N Layers on High Speed Steel Substrates as a Function of Deposition Temperature and Sputtering Atmosphere[J].Journal of Vacuum Science and Technology,1986,A4:2701. |
| [2] | Inoue S;Uchida H;Hioki A et al.Structure and Corn-Position of (TiAI)N Films Prepared by r.f.Planar Magnetron Sputtering Using a Composite Target[J].Thin Solid Films,1995,271:15. |
| [3] | Coil B F;Fontana R;Gates A et al.(TiAl)N Advanced Films Prepared by Arc Process[J].Materials Science and Engineering,1991,A140:8168. |
| [4] | Lii Ding-Fwu;Huang Jow-Lay;Lini Ming-Hung et al.The Effects of TiAl Interlayer on PVD TiAlN Films[J].Surface and Coatings Technology,1998,99:197. |
| [5] | Setsuhara Y;Suzuki T;Makino Y;Miyake S;Sakata T;Mori H;Osaka Univ Ultra High Voltage Electron Microscopy Res Ctr Osaka Japan. .Phase variation and properties of (Ti, Al)N films prepared by ion beam assisted deposition[J].Surface & Coatings Technology,1997(1/3):254-258. |
| [6] | Ta C N;Koh i E S;Akari K .Maeropartieles on TiN Films Prepared by the Arc Ion Plating Process[J].Surface and Coatings Technology,1990,43:324. |
| [7] | Lindfors P A;Mularie W M;Wehner G K .Cathodic Arc Deposition Technology[J].Surface and Coatings Technology,1986,29:275. |
| [8] | Matthews A;Lefkow A R .Problems in the Physical Vapour Deposition of Titanium nitride[J].Thin Solid Films,1985,126:283. |
| [9] | Erturk E;Heuvel H J .Adhesion and Structure of TiN Arc Coatings[J].Thin Solid Films,1987,153:135. |
| [10] | 胡社军,曾鹏,谢光荣.多弧离子镀弧源靶工作条件对氮化钛薄膜中钛液滴的影响[J].真空,2000(02):30. |
| [11] | 李成明,孙晓军,张增毅,唐伟忠,吕反修.过滤电弧抑制薄膜中颗粒机理的实验分析[J].材料科学与工艺,2004(03):268-271. |
| [12] | 张通和;吴瑜光.离子束表面工程技术与应用[M].北京:机械工业出版社,2005 |
| [13] | 李成明,张勇,曹尔妍,薛明伦.磁过滤对多弧离子镀（TiAl）N薄膜的影响[J].中国有色金属学报,2001(z1):179-182. |
| [14] | 刘金声.离子束沉积薄膜技术及应用[M].北京:国防工业出版社,2003 |
| [15] | 宋人娟.多弧离子镀TiN低温涂层的研究[J].金属热处理,1994(06):17. |
| [16] | 宋贵宏;杜吴.硬质与超硬涂层[M].北京:化学工业出版社,2007 |
| [17] | 宫秀敏,孙伟,叶卫平.TiN多弧离子镀过渡层的组成及其对涂层结合力的影响[J].新技术新工艺,2000(09):35-37. |
| [18] | 孙伟,宫秀敏,叶卫平,张覃铁,朱小清.多弧离子镀TiN涂层结合力的影响因素[J].材料保护,2000(08):31-32. |
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