采用双辊连铸工艺制备了硅的质量分数分别为0．5％，1．0%，3．0％，4．5％的硅钢薄带，用光学显微镜观察其组织，并研究了后处理工艺对薄带组织和性能的影响。结果表明：硅含量为0．5％和1．0％的薄带适合采用一次冷轧＋850～950℃退火的后处理工艺，而硅含量在3．0%以上的薄带适合采用二次冷轧＋950℃退火的后处理工艺；硅含量为3．0％和4．5％的薄带在冷轧并950℃退火后，其磁性能最佳，铁芯损耗约为4．30W·hg^-1，磁感应强度约为1．68T。
Silicon steel thin strips with silicon content of 0. 5wt%, 1.0wt%, 3. 0wt% and 4. 5wt% were prepared by twin-roll continuous casting process, and the microstructure of the strips were observed by means of optical microscopy, and on the basis, the effect of post-treatment process on microstructure and properties of the strips was studied. The results show that the post-treatment process of one-time cold rolling and annealing between 850-950 ℃ was suitable for the strips with silicon content of 0. 5wt% and 1.0wt% but the two-times cold roll and annealing at 950℃ was a suitable post-treatment process for the strips with above 3.0wt% silicon. The magnetism properties of the thin strip with silicon content of 3. 0wt% and 4. 5wt% annealed at 950℃ after cold rolling was best, the core loss was about 4. 30 W · kg^-1 and magnetic induction was about 1.68 T.
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