用原子力显微镜(AFM)研究了Al2O3基体上磁控溅射Au/NiCr/Ta薄膜的表面生长形貌以及表面粗糙度,并根据不同的沉积温度探讨了薄膜表面粗糙化机制,从能量角度分析了薄膜晶粒生长的表面能和晶界能交互作用效果.结果表明:磁控溅射的金属薄膜呈现柱状晶生长,随着沉积温度的升高,薄膜表面发生粗糙→光滑→粗糙的变化过程,表面能和晶界能的交互作用效果是导致薄膜表面粗糙度变化的根本原因.
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