采用非平衡磁控溅射技术在不锈钢及Sip（111）基体上制备了含氢无定形碳（a-C∶H）薄膜,沉积的薄膜表面光滑,硬度高,内应力小,膜/基结合力好。利用球-盘摩擦实验机对薄膜在不同真空度（1.0×105、5.0×10-2、1.0×10-2、5.0×10-3 Pa）下的摩擦学行为进行了研究,结果表明,随着真空度的升高,薄膜的摩擦系数逐渐减小,磨损率逐渐增大。在5.0×10-3 Pa时,a-C∶H膜的摩擦学行为发生突变,此时薄膜的摩擦系数为0.005,而耐磨寿命很短。高真空中,薄膜寿命的突变可能与薄膜脱氢而结构发生变化有关。
The a-C∶H film was deposited by unbalanced magnetron sputtering on stainless steel and silicon p（111）.The fabricated a-C∶H film is homogeneously and has a high hardness,low internal stress and a good adhesion with the substrate.The tribological properties of the films under different vacuum degree（1.0×105,5.0×10-2,1.0×10-2,5.0×10-3Pa） were tested on a ball-on-disk machine.The results show that the friction coefficient of the film is decreasing but the wear rate is increasing with the increase of vacuum degree.The tribological properties of the films change dramatically under 5.0×10-3Pa,which has the lowest friction coefficient of 0.005 and an extremely short lifetime.The lifetime in high vacuum is related to the dehydrogenation and the structural transformation of the film.
参考文献
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