利用激光在硅基底上加工具有规则点阵结构的表面纹理,采用自组装技术在此硅表面制备全氟辛烷基三氯硅烷自组装分子膜.采用扫描电子显微镜和表面形貌仪对硅试样表面进行形貌分析,采用接触角测量仪测量试样的接触角.结果表明,激光加工后的硅试样表面纹理深度和表面粗糙度均随激光加工间距的增加而逐渐变大,试样表面的去除量随光照时间的增加而增大.通过激光加工和沉积自组装分子膜,硅试样表面的水接触角显著增大,最大可达到156°,且试样的水接触角随激光加工间距的减少而增大.试样接触角测量值与Cassie模型预测值相一致,当点阵直径与加工间距比＜0.510时,硅试样表面为超疏水表面.
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