描述了TiNi形状记忆合金薄膜的一般特性及成分对其组织及性能的重要影响.磁控溅射法是应用最为广泛的制备TiNi基形状记忆薄膜的方法之一,但由于Ti与Ni的溅射产额不同,很难得到理想成分的TiNi薄膜.目前主要采用改变工艺参数或靶材成分补偿的方法控制薄膜的成分.借鉴反应磁控溅射沉积薄膜时成分控制方法,提出了一种利用溅射靶表面光发射谱的控制技术,理论上可以达到精确检测或控制TiNi形状记忆合金薄膜成分的目的.
The primary characteristics and the effect of composition on microstructure and properties of TiNi shape memory alloy (SMA) thin film were summarized. Magnetron sputtering is currently one of the most widely-used technique for preparing TiNi thin films. But it is difficult to prepare stoichiometric TiNi thin film because of the different sputtering yields between Ti and Ni. At present, changing deposition parameters and altering the target composition are mainly used to control the compositions of TiNi films. A new method for controlling TiNi films composition by determining and controlling the spectral strength of optical emission from the surface of targets were presented based on the composition control method during reactive magnetron sputtering. Theoretically, it is possible to accurately control the compositions of TiNi thin film.
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