利用射频磁控溅射方法,采用Sc_2O_3掺杂(质量百分比2%)ZnO为靶材在石英玻璃上制备透明导电ZnO:Sc(SZO)薄膜.用X射线衍射仪、分光光度计及霍尔测试仪等对样品进行表征,分析了沉积压强从0.3 Pa到2.0 Pa的变化对SZO薄膜的微结构及光学特性的影响.XRD研究结果表明所有样品都是六角密堆积结构,而且溅射压强对SZO薄膜的微结构有着显著的影响.所有SZO薄膜的透过率在可见光区域均大于85%,近紫外区域由于吸收,透射率大大降低.
参考文献
| [1] | Minami T;Yamanoto T;Miyata T .Highly Ttransparent and Conductive Rare Earth-doped ZnO Thin Films Prepared by Magnetron Sputtering[J].Thin Solid Films,2000,366(1-2):63-68. |
| [2] | Wen-Ching Shih;Mao-Jin Wang;I. Nan Lin .Characteristics of ZnO thin film surface acoustic wave devices fabricated using nanocrystalline diamond film on silicon substrates[J].Diamond and Related Materials,2008(3):390-395. |
| [3] | Minami T;Sato H .Group Ⅲ Impurity Doped Zinc Oxide Thin Film Prepared by RF Magnetron Sputtering[J].Japanese Journal of Applied Physics,1985,24:L781-L784. |
| [4] | F. Chaabouni;M. Abaab;B. Rezig .Metrological characteristics of ZNO oxygen sensor at room temperature[J].Sensors and Actuators, B. Chemical,2004(1/2):200-204. |
| [5] | S.Liang;H.Sheng;Y.Liu .ZnO Schottky ultraviolet photodetectors[J].Journal of Crystal Growth,2001(2/4):110-113. |
| [6] | Calnan S;Hupkes J;Rech B;Siekmann H;Tiwari A .High deposition rate aluminium-doped zinc oxide films with highly efficient light trapping for silicon thin film solar cells[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(6):1242-1248. |
| [7] | Kim H;Pique A .Indium Tin Oxide Thin Films for Organic Light-emitting Devices[J].Applied Physics Letters,1999,74:3444. |
| [8] | Coutal C;Azema A;Routson J C .Fabrication and Characterization of ITO Thin Films Deposited by Excimer Laser Evaporation[J].Thin Solid Films,1996,288:248. |
| [9] | Jing-Chie Lin;Kun-Cheng Peng;Hsueh-Lung Liao;Sheng-Long Lee .Transparent conducting Sc-codoped AZO film prepared from ZnO:Al-Sc by RF-DC sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(16):5349-5354. |
| [10] | Purica M.;Budianu E.;Rusu E.;Danila M.;Gavrila R. .Optical and structural investigation of ZnO thin films prepared by chemical vapor deposition (CVD)[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(0):485-488. |
| [11] | 陈肖静,王永谦,朱拓,李果华,张光春.射频溅射功率对ZnO透明导电薄膜光电性能的影响[J].人工晶体学报,2009(02):354-357. |
| [12] | 陆峰;徐成海;裴志亮.ZnO:A1透明导电薄膜的直流反应溅射制备[J].真空科学与技术,2002(增刊):51-54. |
| [13] | 初国强,王子君,刘星元,王立军.离子辅助沉积掺铝氧化锌透明导电膜的研究[J].液晶与显示,2001(02):135-139. |
| [14] | Niino F.;Hirasawa H.;Kondo K. .Deposition of low-resistivity ITO on plastic substrates by DC arc-discharge ion plating[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1):28-31. |
| [15] | Kamalasanan M N;Chandra S .Sol-gel Synthesis of ZnO Thin Films[J].Thin Solid Films,1996,288:112-115. |
| [16] | Ohshima T.;Thareja RK.;Ikegami T.;Ebihara K. .Preparation of ZnO thin films on various substrates by pulsed laser deposition[J].Surface & Coatings Technology,2003(0):517-520. |
| [17] | R. Ayouchi;F. Martin;D. Leinen;J.R. Ramos-Barrado .Growth of pure ZnO thin films prepared by chemical spray pyrolysis on silicon[J].Journal of Crystal Growth,2003(3/4):497-504. |
| [18] | Fang GJ.;Li DJ.;Yao BL. .Effect of vacuum annealing on the properties of transparent conductive AZO thin films prepared by DC magnetron sputtering[J].Physica Status Solidi, A. Applied Research,2002(1):139-152. |
| [19] | Cullity B D.Elements of X-ray Diffractions[M].London:Addition-Wesley,1959:99. |
| [20] | Zhou Q F;Chan H L;Choy C L .Micro-Raman and Ion Channeling Study of Crystal Damage in Si Induced by Focused Co Ion Beam Implantation[J].Applied Physics A:Materials Science and Processing,2000,70(03):293. |
| [21] | Tan ST;Chen BJ;Sun XW;Fan WJ;Kwok HS;Zhang XH;Chua SJ .Blueshift of optical band gap in ZnO thin films grown by metal-organic chemical-vapor deposition - art. no. 013505[J].Journal of Applied Physics,2005(1):13505-0. |
| [22] | Zhao J L .Structural,Optical and Electrical Properties of ZnO Films Grown by Pulsed Laser Deposition(PLD)[J].Journal of Crystal Growth,2005,276:507. |
| [23] | Mandal S;Singha R K .Optical and Structural Characteristics of ZnO Thin Films Grown by RF Magnetron Sputtering[J].Materials Research Bulletin,2008,43:244. |
| [24] | Urbach F .The Long-wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids[J].Physical Review,1953,92:1324. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%