基体偏压是影响磁控溅射TiNx薄膜结构和性能的关键因素,且TiNx薄膜的结构与其耐蚀性有极大的关系.利用直流反应磁控溅射技术,通过改变基体偏压在304不锈钢表面制备了具有结构缺陷和不同化学计量比的TiNx薄膜.采用原子力显微镜(AFM)、X射线衍射、场发射扫描电子显微镜、电化学技术研究了TiNx薄膜的表面形貌、相结构和耐蚀性与偏压的关系.结果表明:TiNx薄膜的表面结构与偏压明显相关,适当的偏压有利于获得细小、均匀、致密和光滑的TiNx薄膜;TiNx薄膜为B1-NaCl型面心立方结构,其择优取向为(111)面,增加偏压有利于获得符合化学计量比的TiNx薄膜;致密、光滑和符合化学计量比的TiNx薄膜具有更低的腐蚀倾向;不同化学计量比的TiNx薄膜的腐蚀均为局部剥离,且与该处高密度结构缺陷相关;减少TiNx薄膜的针孔等结构缺陷对于提高其耐蚀性极为重要.
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