陶瓷薄膜的制备技术多种多样,如物理气相沉积、化学气相沉积、高温烧结和"溶胶-凝胶"法等.这些技术对制备条件都有较高的要求:如高温高真空等.近年发展起来的在低温条件下沉积陶瓷薄膜的技术为我们提供了一种设备简单,在接近室温、常压下可进行操作的方法.本文就这一新兴工艺及其机理进行了评述.
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