研究了研磨剪切作用对聚醚多元醇插层的蒙脱土片层结构的影响.研究发现,随着研磨时剪切应力强度和研磨次数的增加,有机蒙脱土的层间距从2.8 nm逐渐扩大到5.6 nm左右,直至(001)面衍射峰消失.聚醚种类对蒙脱土的片层结构也有一定影响.由此制备的聚醚多元醇/蒙脱土纳米复合物可用于本体法合成聚氨酯/蒙脱土纳米复合弹性体.
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