CIGS薄膜太阳能电池用Mo背电极的制备与结构性能研究

材料导报, 2011, 25(12): 74-77.

CIGS薄膜太阳能电池用Mo背电极的制备与结构性能研究

赵志明 ^1, , 丁宇 ^2, , 曹智睿 ^3, , 田亚萍 ^4, , 屈直 ^5, , 张国君 ^6, , 蒋百灵 ^7,

1.西安理工大学材料学院,西安710048

2.西安理工大学材料学院,西安710048

3.西安理工大学材料学院,西安710048

4.西安理工大学材料学院,西安710048

5.西安理工大学材料学院,西安710048

6.西安理工大学材料学院,西安710048

7.西安理工大学材料学院,西安710048

基金项目: 陕西省自然科学基金(101-221007) 陕西省重点学科建设专项资金

关键词： Mo薄膜 , 磁控溅射 , XRD , SEM

Study of Structure and Properties of Mo Thin Films Prepared by Magnetron Sputtering

利用磁控溅射技术在Sode-lime玻璃衬底上沉积CIGS薄膜太阳能电池用金属Mo背电极薄膜,并研究了Mo靶功率、基片脉冲宽度以及预清洗时间对Mo薄膜的相结构、形貌及电阻率的影响.结果表明,沉积的Mo薄膜均沿(110)晶面呈柱状择优生长;增大Mo靶溅射功率可以促进薄膜晶粒长大、提高薄膜的致密性、降低电阻率;合适的基片脉冲电压脉宽促进了晶核的形成、长大并有助于沉积过程中Mo晶粒长大,进而降低薄膜电阻率;通过延长预清洗时间可获得致密性好、电阻率低的Mo薄膜,所获得的Mo薄膜最低电阻率为3.5×10-5Ω·cm.

参考文献

[1]	J Thieme,S Gleber,G Mitrea,P Guttmann.软X射线显微术和光谱显微术[J].光学精密工程,2007(12):1878-1885.
[2]	Kinoshito H;Kurihara K;Mizota T et al.Soft X-ray reduction lithography using multilayer mirrors[J].Journal of Vacuum Science and Technology B:Microelectronics and Nanometer Structures,1989,7(06):1648.
[3]	Iwata S;Yamamoto N;Kobayashi N et al.A new tungsten gate process for VLSI applications[J].IEEE Transactions on Electron Devices,1984,31(09):1174.
[4]	Shah P L .Refractory metal gate processes for VLSI applications[J].IEEE Transactions on Electron Devices,1979,26(04):631.
[5]	Gordillo G.;Hernandez LC.;Grizalez M. .Structural and electrical properties of DC sputtered molybdenum films[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,1998(3/4):327-337.
[6]	Assmann L;Bernede JC;Drici A;Amory C;Halgand E;Morsli M .Study of the Mo thin films and Mo/CIGS interface properties[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(1/3):159-166.
[7]	Scofield JH.;Albin D.;Ballard BL.;Predecki PK.;Duda A. .SPUTTERED MOLYBDENUM BILAYER BACK CONTACT FOR COPPER INDIUM DISELENIDE-BASED POLYCRYSTALLINE THIN-FILM SOLAR CELLS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1995(1):26-31.
[8]	Coad J P;Dugdale R A;Martindale L P .The effects of substrate heating and ion cleaning on thick film adhesion[J].VACUUM,1981,31(8-9):365.
[9]	Gautier C.;Machet J. .STUDY OF THE GROWTH MECHANISMS OF CHROMIUM NITRIDE FILMS DEPOSITED BY VACUUM ARC EVAPORATION[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):43-52.
[10]	Cullity B D.Elements of X-ray diffraction[M].London:Addison Wesley,1978

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网

CIGS薄膜太阳能电池用Mo背电极的制备与结构性能研究

Study of Structure and Properties of Mo Thin Films Prepared by Magnetron Sputtering

参考文献