氧化钒薄膜及其在微电子和光电子领域中的应用已成为国际上新颖功能材料研究的热点之一.本文综述了V2O5和VO2薄膜电学性能与薄膜组分和结构的相关性,比较了不同工艺制备的氧化钒薄膜的电学性能差异.
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