采用 ANSYS 有限元软件模拟分析了赫尔槽阴极表面的电流密度和电势的分布，研究了沿赫尔槽阴极电势分布对电流密度分布的影响。结果表明，模拟计算的电流密度分布与理论电流密度分布基本一致；随离阳极的距离增大，赫尔槽的上梯形边电势先缓慢下降后急剧下降，下梯形边反之；阴极表面的电流密度呈近端高远端低的趋势；阴极电流密度分布与距离阴极10 mm平行面上的电势分布具有相关性。
The distributions of current density and potential along the cathode of a Hull cell was simulated and analyzed using ANSYS, a finite element software. The effect of potential distribution along the cathode of a Hull cell on the current density distribution was studied. It is shown that the simulated current density distribution is basically the same as the theoretical current density distribution. The potential of the upper base of trapezoid-like Hull cell is decreased slowly initially and then dramatically with increasing distance from cathode;whereas, for the down trapezoid, it is on the contrary. The current density on cathode surface is high at the end near the anode but low at the other end. The distribution of cathodic current density has correlation to the distribution of potential at the parallel plane 10 mm far from the cathode surface.
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