Si衬底上La0.8Sr0.2MnO3/SrMnO3双层结构研究

功能材料, 2004, 35(z1): 620-629.

Si衬底上La0.8Sr0.2MnO3/SrMnO3双层结构研究

杜永胜 ^1, , 王波 ^2, , 许仕龙 ^3, , 于敦波 ^4, , 李彤 ^5, , 严辉 ^6, , 张深根 ^7,

1.北京工业大学,材料学院薄膜材料与技术研究室,北京,100022

2.北京工业大学,材料学院薄膜材料与技术研究室,北京,100022

3.北京工业大学,材料学院薄膜材料与技术研究室,北京,100022

4.北京有色金属研究总院,北京,100088

5.北京工业大学,材料学院薄膜材料与技术研究室,北京,100022

6.北京工业大学,材料学院薄膜材料与技术研究室,北京,100022

7.北京有色金属研究总院,北京,100088

基金项目: 北京市自然科学基金(G2021003) 科技部专项基金(G2002CCC01300)

关键词： LSMO薄膜 , SMO缓冲层 , 择优取向生长 , 界面扩散

Structural research of La0.8Sr0.2MnO3/SrMnO3 bilayers on Si (100) substrates

利用磁控溅射方法在Si(100)衬底上首先生长SrMnO3(SMO)作为缓冲层,再沉积La0.8Sr0.2MnO3(LSMO)薄膜,得到(110)面择优生长的LSMO/SMO双层结构.利用X射线衍射仪分析了SMO缓冲层的结构特征对LSMO薄膜择优取向生长的影响;利用Rutherford背散射(RBS)分析了LSMO/SMO间的界面情况.结果表明:以SMO作为单一缓冲层时,不仅可以实现LSMO薄膜在Si(100)衬底上的(110)面的择优生长,而且LSMO/SMO的界面扩散现象也不明显.

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