溅射环境下基于薄膜的沉积速率和Langmuir探针测出的基片位置处离子流通量量化了单位时间内基片表面微区所接受的溅射中性原子的轰击能量Ec1和各种轰击离子传递给基片的轰击能量Ec2;Ec1和Ec2的数量级近似相同,Ec1和Ec2同时作用于基片表面微区加速了薄膜沉积过程中最表层原子的表面扩散进程,Ec1和Ec2持续作用所引起的能量积淀和温升效应可促进薄膜表层下方原子的体扩散进程.
参考文献
| [1] | Kelly P J;Amell R D .Magnetron Sputtering:a Review of Recent Developments and Application[J].VACUUM,2000,S6:159-172. |
| [2] | Window B .Recent Advances in Sputter Deposition[J].Surface and Coatings Technology,1995,71:93-97. |
| [3] | Musil J. .Recent advances in magnetron sputtering technology[J].Surface & Coatings Technology,1998(1/3):280-286. |
| [4] | R. D. Arnell;P. J. Kelly .Recent advances in magnetron sputtering[J].Surface & Coatings Technology,1999(1/3):170-176. |
| [5] | S. Eisermann;J. Sann;A. Polity;B.K. Meyer .Sputter deposition of ZnO thin films at high substrate temperatures[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(20):5805-5807. |
| [6] | K. Yamaguchi;M. Haraguchi;T. Katsumata;K. Shimura;H. Yamamoto;K. Hojou .Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2004(1):13-16. |
| [7] | 张化福,刘瑞金,刘汉法,陈钦生,王新峰,梅玉雪.衬底温度对直流磁控溅射法制备掺锆氧化锌透明导电薄膜性能的影响[J].人工晶体学报,2010(03):766-770,775. |
| [8] | Hofsass H;Rotter F;Uhnnacher M;Zhang K;Ronning C;Krauser J .Sputter erosion of ferromagnetic thin films[J].Surface & Coatings Technology,2007(19/20):8477-8481. |
| [9] | Adjaottor;Meletis;Logothetidis et al.Effect of Substrates Bias on Sputter Deposited TiCx,TiNy and TiCx Ny Thin Films[J].Surface and Coatings Technology,1995,76-77:142-148. |
| [10] | Z.T. Yang;B. Yang;L.P. Guo .Effect of bias voltage on the structure and hardness of Ti-Si-N composite coatings synthesized by cathodic arc assisted middle-frequency magnetron sputtering[J].Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics,2009(1/2):437-441. |
| [11] | Arnell R D;Kelly P J;Musil J .Recent Advances in Pulsed Magnetron Sputtering[J].Surface and Coatings Technology,2004,188-189:170-176. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%