利用射频磁控溅射技术成功地在Si衬底上沉积Ni-Mn-Ga薄膜,并采用XRD、SEM、AFM及 EMPA系统研究Ni-Mn-Ga薄膜的晶体学结构、断面形貌、表面形貌、成分及其影响规律.结果表明,经823K退火1h Ni-Mn-Ga薄膜完全晶化,室温下呈L21型体心立方结构;断面形貌揭示Ni-Mn-Ga薄膜呈柱状结构.Ni-Mn-Ga薄膜的表面粗糙度随溅射功率和溅射时间的增加而增大;Ni-Mn-Ga薄膜中Ga的含量受溅射功率影响较大,Ni的含量受溅射时间影响较大.
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