欢迎登录材料期刊网

材料期刊网

高级检索

应用非晶的Ti-Al薄膜为导电阻挡层,采用射频磁控溅射法和溶胶-凝胶法在Si衬底上制备了La_(0.5)Sr_(0.5)CoO_3/Pb(Zr_(0.4),Ti_(0.6))O_3/La_(0.5)Sr_(0.5)CoO_3/Ti-Al/Si (LSCO/PZT/LSCO/Ti-Al/Si)异质结,研究了550 ℃常规退火(CTA)和快速退火(RTA)工艺对LSCO/PZT/LSCO/Ti-Al/Si结构和性能的影响.实验发现非晶Ti-Al薄膜在经过不同退火工艺后仍具有非晶结构,快速退火6 min的样品具有较好的物理性能.在418 kV/cm的外加电场下,LSCO/PZT/LSCO电容器的剩余极化强度和矫顽电场强度分别为22 μC/cm~2和83 kV/cm.LSCO/PZT/LSCO电容器的漏电行为不依赖于退火工艺,当电场强度低于46.7 kV/cm时为欧姆导电,高于46.7 kV/cm时为肖特基导电机制.

参考文献

[1] Pertsev NA.;Kukhar VG.;Kohlstedt H.;Waser R. .Phase diagrams and physical properties of single-domain epitaxial Pb(Zr1-xTix)O-3 thin films - art. no. 054107[J].Physical review, B. Condensed matter and materials physics,2003(5):4107-0.
[2] Zhu Z X;Li J F;Lai F P et al.Phase Structure of Epitaxial Pb(Zr,Ti)O_3 Thin Films on Nb-doped SrTiO_3 Substrates[J].Applied Physics Letters,2007,91:222910.
[3] R. Yimnirun;R. Wongmaneerung;S. Wongsaenmai;A. Ngamjarurojana;S. Ananta;Y. Laosiritaworn .Dynamic hysteresis and scaling behavior of hard lead zirconate titanate bulk ceramics[J].Applied physics letters,2007(11):112908-1-112908-3-0.
[4] Auciello O;Scott J F;Ramesh R .The Physics of Ferroelectric Memories[J].Physics Today,1998,51(07):22-27.
[5] Hiroki Kuwabara;Nicolas Menou;Hiroshi Funakubo .Strain and in-plane orientation effects on the ferroelectricity of (111)-oriented tetragonal Pb(Zr_(0.35)Ti_(0.65))O_(3) thin films prepared by metal organic chemical vapor deposition[J].Applied physics letters,2007(22):222901-1-222901-3-0.
[6] Morrison FD;Jung DJ;Scott JF .Constant-phase-element (CPE) modeling of ferroelectric random-access memory lead zirconate-titanate (PZT) capacitors[J].Journal of Applied Physics,2007(9 Pt.1):94112-1-94112-5-0.
[7] H. Kohlstedt;Y. Mustafa;A. Gerber;A. Petraru;M. Fitsilis;R. Meyer;U. Boettger;R Waser .Current status and challenges of ferroelectric memory devices[J].Microelectronic engineering,2005(1):296-304.
[8] Siu J.W.K.;Eslami Y.;Sheikholeslami A.;Gulak P.G.;Endo T.;Kawashima S. .A current-based reference-generation scheme for 1T-1C ferroelectric random-access memories[J].IEEE Journal of Solid-State Circuits,2003(3):541-549.
[9] Yang B;Aggarwal S;Dhote AM;Song TK;Ramesh R;Lee JS;LG ELECT RES CTR SEOCHO GU SEOUL 137140 SOUTH KOREA. .La0.5Sr0.5CoO3/Pb(Nb0.04Zr0.28Ti0.68)O-3/La0.5Sr0.5CoO3 thin film heterostructures on Si using TiN/Pt conducting barrier[J].Applied physics letters,1997(3):356-358.
[10] S. R. Summerfelt;T. S. Moise;G. Xing;L. Colombo;T. Sakoda;S. R. Gilbert;A. L. S. Loke;S. Ma;L. A. Wills;R. Kavari;T. Hsu;J. Amano;S. T. Johnson;D. J. Vestcyk;M. W. Russell;S. M. Bilodeau;P. van Buskirk .Demonstration of scaled (≥0.12 μm~(2)) Pb(Zr,Ti)O_(3) capacitors on W plugs with Al interconnect[J].Applied physics letters,2001(24):4004-4006.
[11] B. T. Liu;C. S. Cheng;F. Li;L. Ma;Q. X. Zhao;Z. Yan;D. Q. Wu;C. R. Li;Y. Wang;X. H. Li;X. Y. Zhang .Ni-Al diffusion barrier layer for integrating ferroelectric capacitors on Si[J].Applied physics letters,2006(25):252903-1-252903-3-0.
[12] B. T. Liu;K. Maki;S. Aggarwal;B. Nagaraj;V. Nagarajan;L. Salamanca-Riba;R. Ramesh;A. M. Dhote;O. Auciello .Low-temperature integration of lead-based ferroelectric capacitors on Si with diffusion barrier layer[J].Applied physics letters,2002(19):3599-3601.
[13] Hong Liu;Jianguo Zhu;Dingquan Xiao;Xiaogang Gong;Jin-e Liang;Xuedong Li;Xiaohong Zhu .Influence of electrode configuration on dielectric properties of ferroelectric films with interdigital and parallel plate electrodes[J].Applied physics letters,2007(18):182907-1-182907-3-0.
[14] Bruno E;De Santo MP;Castriota M;Marino S;Strangi G;Cazzanelli E;Scaramuzza N .Morphological and electrical investigations of lead zirconium titanate thin films obtained by sol-gel synthesis on indium tin oxide electrodes[J].Journal of Applied Physics,2008(6):064103-1-064103-6-0.
[15] Menou N;Funakubo H .(111)-Oriented Pb(Zr,Ti)O_3 Films Deposited on SrRuO_3/Pt Electrodes:Reproducible Preparation by Metal Organic Chemical Vapor Deposition,Top Electrode Influence,and Reliability[J].Journal of Applied Physics,2007,102:114105.
[16] A. Lookman;R. M. Bowman;J. M. Gregg;J. Kut;S. Rios;M. Dawber;A. Ruediger;J. F. Scott .Thickness independence of true phase transition temperatures in barium strontium titanate films[J].Journal of Applied Physics,2004(1):555-562.
[17] D. J. You;W. W. Jung;S. K. Choi;Yasuo Cho .Domain structure in a micron-sized PbZr_(1-x)Ti_(x)O_(3) single crystal on a Ti substrate fabricated by hydrothermal synthesis[J].Applied physics letters,2004(17):3346-3348.
[18] Hana H;Zhong J;Kotru S et al.Improved Ferroelectric Property of LaNiO_3/Pb(Zr_(0.2)Ti_(0.8))O_3 /LaNiO_3 Capacitors Prepared by Chemical Solution Deposition on Platinized Silicon[J].Applied Physics Letters,2006,88:092902.
[19] Blom P W M;Wolf R M;Cillessen J F M et al.Ferroelectric Schottky Diode[J].Physical Review Letters,1994,73:2107-2110.
[20] Pabst GW;Martin LW;Chu YH;Ramesh R .Leakage mechanisms in BiFeO3 thin films[J].Applied physics letters,2007(7):72902-1-72902-3-0.
[21] Mohamed-Tahar Chentir;Emilien Bouyssou;Laurent Ventura;Christine Anceau .Leakage current evolution versus dielectric thickness in lead zirconate titanate thin film capacitors[J].Journal of Applied Physics,2009(6):061605-1-061605-7-0.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%