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分别采用Tersoff势与S-W势对不同温度下Si(100)面重构情况进行分子动力学模拟,找出了这两种势函数下发生重构的温度范围,进而采用S-W势对几种典型情况进行模拟研究.结果发现,二聚体形成前后的温度、内能会出现明显变化,高温时重构速度快但效果较差且不稳定,会形成吸附单体.原子间距为0.33nm左右是二聚体形成的关键距离.

参考文献

[1] Fu C C;Weissmann M;Saul A .[J].Applied Surface Science,2001,481:97-104.
[2] Brocks G;Kelly P J .[J].Physical Review Letters,1996,76:2362-2365.
[3] Lee G D;Wang C Z;Lu Z Y et al.[J].Surface Science,1999,426:L427-L432.
[4] Miotto R.;Ferraz AC.;Srivastava GP. .Comparative study of the adsorption of C2H4 on the Si(001) and Ge(001) surfaces[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2002(0):12-17.
[5] Mete E;Shaltaf R;Ellialtioglu S .DFT study of Rb/Si(100)-2 x 1 system[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2005(2/3):119-125.
[6] Tabata T;Aruga T;Murata Y .[J].Surface Science,1987,179:L63-L67.
[7] Mnnz A W;Ziegler C;Gopel W .[J].Physical Review Letters,1995,74:2244-2247.
[8] Lbullock E;Gunnella L;Pauhey T .[J].Physical Review Letters,1995,74:2756-2759.
[9] Shkrebtii A .[J].Physical Review B:Condensed Matter,1995,51:11201-11204.
[10] Wolkow R A .[J].Physical Review Letters,1992,68:2636-2639.
[11] Kubota M;Murata Y .[J].Physical Review B:Condensed Matter,1994,49:4810-4814.
[12] Hata K.;Shigekawa H.;Yasuda S. .Reinterpretation of the scanning tunneling microscopy images of Si(100)-(2 x 1) dimers[J].Physical Review.B.Condensed Matter,1999(11):8164-8170.
[13] Takashi Y;Tunio T .[J].Physical Review B:Condensed Matter,2000,61:R5078-R5081.
[14] 郏正明,杨根庆,程兆年,柳襄怀,邹世昌.Si(001)表面层及近表面层原子行为的分子动力学模拟研究[J].物理学报,1994(04):609-615.
[15] 郏正明,杨根庆,程兆年,柳襄怀,邹世昌.TABLE OF CONTENTS and ABSTRACTS reprinted from ACTA PHYSICA SINICA, Vol.43, No.2(1994)(in Chinese)[J].ACTA PHYSICA SINICA,1994(11):870.
[16] 周立新;沈学英 .[J].真空科学与技术,1997,17(01):19-25.
[17] 满振勇,冯锡淇.C20与Si(100)-(2×1)重构表面相互作用的计算机模拟研究[J].计算物理,2000(01):65-70.
[18] 黄燕,朱晓焱.硅表面双聚体空位附近原子沉积的理论研究[J].苏州大学学报(自然科学版),2003(04):62-67.
[19] 梁志均,黄臻成,王莉,邵元智,何振辉.碳团簇与硅单晶表面重构的蒙特卡罗模拟探索[J].中山大学学报(自然科学版),2004(z1):26-32.
[20] 于威,滕晓云,李晓苇,张连水,付广生.C与Si重构表面碰撞过程的分子动力学模拟[J].光电子·激光,2001(06):578-581.
[21] 舒大军 .表面动力学性质的计算和理论研究[D].中国科学院固体物理研究所,2001.
[22] Tersoff J .[J].Physical Review Letters,1988,61:2879-2882.
[23] Tersoff J .[J].Physical Review B:Condensed Matter,1989,39:5566-5568.
[24] Stillinger F H;Weber T A .[J].Physical Review B:Condensed Matter,1985,31:5262-5271.
[25] 吴兴惠;项金钟.现代材料计算与设计教程[M].北京:电子工业出版社,2002:54-55.
[26] Balamane H;Halicioglu T;Tiller W A .[J].Physical Review B:Condensed Matter,1992,46:2250-2279.
[27] Cook S J;Clancy P .[J].Physical Review B:Condensed Matter,1993,47:7686-7699.
[28] Dabrowski J;Müssig H J.Silicon Surface and Formation of Interfaces[M].北京:兴界图书出版公司北京公司,1999:206-236.
[29] 陈舜麟.计算材料科学[M].北京:化学工业出版社,2005:136-139.
[30] Goldwin L;Skinnera J;Pettifor D G .[J].EUROPHYSICS LETTERS,1989,9:701-706.
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