采用磁控溅射法,分别在铜基、铝基上制备AIN/TiNxOy/Al多层膜,对比了该膜系与铜基和铝基的粘附性能,分析了与基底粘附性能的差异原因.采用二次阳极氧化方法使铝基底表面形成多孔微结构,再次镀多层膜,表征了膜系的表面形貌、光谱吸收性能和反射率,研究了微结构对薄膜性能的影响.结果表明:薄膜与铝基的粘附性较好,基底表面形成多孔微结构能有效提高其光谱吸收率.
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