主要研究多晶硅太阳能电池片工业制绒的酸腐蚀过程,腐蚀液是由HNO3、HF和H2 SiF6组成的混合液,未添加其他试剂作为反应缓释剂;采用SEM和紫外分光光度计对多晶硅片表面制绒形貌进行观察和检测分析.实验过程中,按照工业生产的实际模型,首先研究确定了最佳腐蚀时间为2 min,之后主要研究了酸腐蚀过程中的H2SiF6浓度对多晶硅表面制绒效果的影响,优化得到H2SiF6的最低含量为2%,并确定最佳腐蚀工艺条件,为进一步回收利用腐蚀废液提供依据.
参考文献
[1] | Spiegel M.;Gerhards C.;Huster F.;Jooss W.;Fath P.;Bucher E. .Industrially attractive front contact formation methods for mechanically V-textured multicrystalline silicon solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2002(1/4):175-182. |
[2] | Daisuke N;Hiroaki M;Shuichi H et al.Large-size multicrystalline silicon solar cell with honeycomb textured surface and point-contacted rear toward industrial production[J].Solar Energy Materials and Solar Cells,2011,95(01):49. |
[3] | Weberl K J;Blakersl A W;Stocksl M J.Thin silicon cells using novel LASE process[A].Osaka,Japan,2003 |
[4] | Ruby DS.;Zaidi SH.;Narayanan S.;Damiani BM.;Rohatgi A. .Rie-texturing of multicrystalline silicon solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2002(1/4):133-137. |
[5] | Nositschka WA.;Voigt O.;Manshanden P.;Kurz H. .Texturisation of multicrystalline silicon solar cells by RIE and plasma etching[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2003(2):227-237. |
[6] | Macdonald D H;Cuevas A;Kerr M J et al.Texturing industrial multicrystalline silicon solar cells[J].Solar Energy Materials and Solar Cells,2004,76(01):277. |
[7] | Panek P;Lipinski M;Dutkiewicz J .Texturization of multicrystalline silicon by wet chemical etching for silicon solar cells[J].Journal of Materials Science,2005(6):1459-1463. |
[8] | 王立建,刘彩池,孙海知,郝秋艳.多晶硅太阳电池酸腐表面织构的研究[J].光电子·激光,2007(03):289-291. |
[9] | 张发云,叶建雄.多晶硅太阳电池酸腐蚀绒面技术研究进展[J].电源技术,2010(03):307-309. |
[10] | 邵俊刚,廖华,黄小龙,陈义,李雷,李承晴.酸腐蚀液对多晶硅表面织构的影响[J].太阳能学报,2010(12):1563-1567. |
[11] | 张妹玉,陈朝.两步腐蚀法制备多晶硅绒面[J].半导体光电,2011(02):243-247. |
[12] | 解希玲,谭毅,李佳艳,董伟,刘艳娇,邹清川.腐蚀时间对多孔硅层形貌及多晶硅性能的影响[J].机械工程材料,2011(09):58-60,84. |
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