采用微波等离子体技术在CH4-H2-C2H6气体条件下制备了钛基掺硼金刚石薄膜.四点探针法测得薄膜电阻率在零掺杂时为1×1012Ω*cm ,当反应气源中B/C上升为5×10-3时电阻率降至5×10-3 Ω*cm.扫描电镜显示掺硼金刚石具有完整晶型和致密结构.拉曼光谱观察到金刚石结构在掺杂前后发生明显改变.采用循环伏安测试了Ti/BDD电极的电化学参量,并与PbO2, Sn-Sb and PbO2-Er三种电极进行阳极氧化对-硝基酚的对比实验.结果表明,在Ti/BDD电极上,对-硝基酚的总有机碳去除率接近100%,远高于其它三种电极.
Boron doped diamond films on Ti substrates were prepared by microwave plasma chemical vapor deposition(MPCVD) in the reactant gas of H2-CH4-B2H6. Resistivity of the undoped and doped films was measured by the 4-probe measurement method, which reduced from 1×1012 -5×10-3 Ω*cm with the increasing of the atomic ratio B/C from 0 to 5×10-3. Scanning electron microscope and Raman spectroscopy were used to characterize the morphology and microstructure of these films. Electrochemical behavior of BDD electrode was tested by Cyclic-voltammetry. p-nitrophenol, a common pollutant, was electrolyzed by using the BDD electrodes, as well as the PbO2, Sn-Sb and PbO2-Er electrodes as anode. The comparison of the removal of the total organic carbon using those electrodes shown above demonstrated that the Ti/BDD electrode producing a TOC decrease of approximately 100% has the best electrochemical property.
参考文献
| [1] | Matt Hupert;Alexander Muck;Jian Wang;Jason Stotter;Zuzana Cvackova;Shannon Haymond;Yoshiyuki Show;Greg M.Swain .Conductive diamond thin-films in electrochemistry[J].Diamond and Related Materials,2003(10/11):1940-1949. |
| [2] | Iniesta J;Michaud P A;Panizza M et al.Electrochemical Oxidation of Phenol at Boron-doped Diamond Electrode[J].Electrochimica Acta,2001,46:3573. |
| [3] | Troster I;Fryda M;Ferrmann D et al.Electrochemical Advanced Oxidation Process for Water Treatment Using DiaChemR Electrodes[J].Diamond and Related Materials,2002,11:64. |
| [4] | Panizza M;Michaud P A;Cerisola G et al.Electrochemical Treatment of Wastewaters Containing Organic Pollutants on Boron-doped Diamond Electrodes:Prediction of Specific Energy Consumption and Required Electrode Area[J].Electrochemistry Communications,2001,3:336. |
| [5] | Genini V;Gallego A;de Oliveira et al.Int.Biodegradtion and Detoxification of p-nitrophenol by Rhodococcus Wratislaviensis[J].International Biodeterioration and Biodegradation,2005,55:103. |
| [6] | Ferreira N G;Abramof E;Corat E J et al.Stress Study of HFCVD Boron-doped Diamond Films by X-ray Diffraction Measurements[J].Diamond and Related Materials,2001,10:750. |
| [7] | Qi H F;Grácio J;Pereira E .Residual Stresses in Chemical Vapour Deposited Diamond Films[J].Diamond and Related Materials,2000,9:1739. |
| [8] | Gerger I;Haubner R;Kronberger H et al.Investigation of Diamond Coatings on Titanium Substrates for Electrochemical Applications[J].Diamond and Related Materials,2004,13:1062. |
| [9] | Zhang R J;Lee S T;Lam Y W .Characterization of Heavily Boron-doped Diamond Films[J].Diamond and Related Materials,1996,5:1288. |
| [10] | Panizza M;Duo I;Michaud P A et al.Electrochemical Generation of Silver (II) at Boron-doped Diamond Electrodes[J].Electrochemical and Solid-State Letters,2000,3:550. |
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