Anatase titania nanostructures have been synthesized at room temperature by plasma enhanced chemical vapor deposition (PECVD) process on silicon (100) substrates using titanium tetraisopropoxide [Ti(OC3H7)4, TTIP] vapor, argon and oxygen mixtures under various deposition pressures. The deposited titania has been characterized for its structural, morphological and chemical composition by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray (EDX) spectroscopy and Fourier transform infrared (FTIR) spectroscopy recordings. With the variation of deposition pressure, titania assumes various nanostructures viz. nanocrystals, nanoparticles, noanorods and comb-like structure. EDX and FTIR measurements show that the deposited titania is of high chemical purity. The possible growth mechanisms for the observed titania nanostructures have been discussed.
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