采用诱导型耦合等离子体辅助直流磁控溅射法在石英玻璃片上反应沉积TiO2薄膜, 通过X射线衍射(XRD)、透射电子显微镜(TEM)和紫外可见光谱(UV-Vis)对薄膜特性进行表征. 结果表明, 叠加诱导型耦合等离子体和局部富氧增加了等离子体的反应活性, 在金属溅射模式和低于 200 ℃的沉积条件下, 制备了高质量的锐钛矿相TiO2薄膜; 该薄膜在550 nm处的折射率和消光系数分别为2.51 和7.8×10-4.
TiO2 thin films have been deposited on unheated glass substrates by an inductively coupled plasma (ICP) assisted direct current (dc) reactive magnetron sputtering. XRD, TEM and UV-Vis spectrophotometer have been used to characterize the films. It is shown that the addition of an ICP and the change of gas input strongly affect film growth and structure. High quality anatase phase TiO2 film has been prepared at the metallic mode of sputtering and at low deposition temperature by using the ICP assisted dc reactive magnetron sputtering and creating a gradient of oxygen favoring the oxidation of the growing film. This film is quite transparent in the visible region, and its refractive index n and the extinction coefficient K at 550 nm are 2.51 and 7.8×10-4, respectively.
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