SYNTHESIS AND MICROSTRUCTURE OF SUPERHARD TiN/SiNx MULTILAYER THIN FILMS

金属学报(英文版), 2005, 18(3): 242-248.

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1.Advanced Coatings Applied Research Laboratory (ACARL), Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, Kowloon, Hong Kong, China;Centre for Advanced Materials Technology (CAMT), School of Aerospace,Mechanical and Electronic Engineering, University of Sydney, Sydney, NSW 2006, Australia

2.Advanced Coatings Applied Research Laboratory (ACARL), Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, Kowloon, Hong Kong, China

3.Advanced Coatings Applied Research Laboratory (ACARL), Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, Kowloon, Hong Kong, China

4.Centre for Advanced Materials Technology (CAMT), School of Aerospace, Mechanical and Electronic Engineering, University of Sydney, Sydney, NSW 2006, Australia

5.Advanced Coatings Applied Research Laboratory (ACARL), Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, Kowloon, Hong Kong, China

基金项目: the Research Grant Council of the Hong Kong Special Administrative Region, China(CityU 9440021)

SYNTHESIS AND MICROSTRUCTURE OF SUPERHARD TiN/SiNx MULTILAYER THIN FILMS

Keywords： multilayers

Multilayer thin films of TiN/SiNx have been deposited onto heated Si 100 substrates (200℃) by reactive dc-magnetron sputtering from Ti and Si targets in an Ar-N2 gas mixture. The rotation speed of the substrate holder was varied from 1 to 20rpm, while target currents were held constant, to produce bilayer periods varying from approximately 22 to 0.6nm. These multilayer films were characterized by atomic force microscopy (AFM), cross-sectional transmission electron microscopy (TEM), scanning electron microscopy (SEM), and microhardness measurements. TEM and SEM studies showed elimination of columnar structure in TiN, owing to the incorporation of amorphous SiNx layers. The crystallinity of TiN and amorphous nature of SiNx were confirmed by high resolution TEM. An optimum rotation speed was observed, at which hardness was a maximum. The resulting bilayer period was found to be approximately 1.6nm,which resulted in a significant improvement in microhardness (～5TGPa). The rms surface roughness for this film was less than 1.5nm.

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SYNTHESIS AND MICROSTRUCTURE OF SUPERHARD TiN/SiNx MULTILAYER THIN FILMS

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