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以正硅酸乙酯(TEOS)和丙醇锆Zr(Ⅳ)-propoxide为先驱体,HAc作为螯合剂,采用溶胶-凝胶工艺制备了不同锆含量(XZr)的一系列SiO2-ZrO2块材,用旋涂法制备了硅基薄膜,并经FTIR表征.折射率测试表明,当XZr≤20%时,Zr能够进入Si-O-Si网络,有效的调控材料的折射率.当XZr>20%时,由于HAc对Zr的螯合作用使丙醇锆无法充分水解,而主要以配合物的形式存在于材料中,导致了薄膜严重龟裂,折射率偏离线性变化;研究获得了旋涂工艺参数对硅基SiO2-ZrO2薄膜厚度的调控规律.

参考文献

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