欢迎登录材料期刊网

材料期刊网

高级检索

以多孔阳极氧化铝(AAO)膜制备纳米材料时降低AAO膜孔径至关重要,降低电压无法达到要求,而降低氧化温度可实现这一目标。在0.4mol/L H3PO4溶液中加入70%~80%(体积分数)1,3-丙三醇(PDO),于-10~10℃下恒压110V阳极氧化1h制备了多孔阳极氧化铝(AAO)膜,并在0.50mol/LH,B03和0.05mol/L Na2B4O7溶液中于20℃下以0.5mA/cm。进行填孔后处理。利用SEM,EDS,XRD分析了AAO膜的表面彤貌与组成。并对AAO膜填孔前后的极化曲线和交流阻抗谱进行了测试。结果表明,膜孔径随氧化温度降低而降低,80%PDO,10℃所得AAO膜的成分包括65.94%(质量分数,下同)Al,12.79%C,20.29%O和0.98%P;随氧化温度升高和PDO含量下降,AAO膜的稳定电流密度增大;随氧化温度升高,膜阻挡层厚度增大;填孔试验前AAO膜只存在一个阻挡层的相位角峰,填孔后出现两个峰,中高频段体现封闭的阻挡层特性,低频段体现的是多孔层封闭部分的特性。

参考文献

[1] Asoh H;Uehibori K;Ono S .Structural features of anodic oxide films formed on aluminum substrate coated with selfassembled microspheres[J].Corrosion Science,2009,51(07):1496-1500.
[2] Belwalkar A;Grasing E;Geertruyden W V et al.Effect of processing parameters on pore structure and thickness of anodic aluminum oxide(AAO)tubular membranes[J].Journal of Membrane Science,2008,319(1/2):192-198.
[3] Thompson G E;Furneaux R C;Wood G C et al.Nucleation and growth of porous anodic films on aluminum[J].Nature,1978,272(5652):433-435.
[4] Randon J.;Govyadinov AN.;Paterson R.;Mardilovich PP. .COMPUTER SIMULATION OF INORGANIC MEMBRANE MORPHOLOGY .3. ANODIC ALUMINA FILMS AND MEMBRANES[J].Journal of Colloid and Interface Science,1995(2):335-341.
[5] Ono S;Masuko N .Dissolution behavior of the barrier layer of porous anodic films formed on aluminum studied by pore-filling technique[J].Japanese Journal of Institute of Light Metals,1993,43(09):447-452.
[6] Ono S;Ichinose H;Masuko N .Defects in porous anodic films formed on high purity aluminum[J].Journal of the Electrochemical Society,1991,138(12):3705-3710.
[7] Dekker A J;Middelhoek A .Transport Numbers and the Structure of Porous Anodic Films on Aluminum[J].Journal of the Electrochemical Society,1970,117(04):440-448.
[8] Ebihara K;Takahashi H;Nagayama M .Structure and Density of Anodic Oxide Films Formed on Aluminum in Oxalic Acid Solutions[J].Journal of the Meteorological Society of Japan,1983,34(11):548-553.
[9] Routkevitch D;Bigioni T;Moskovits M et al.Electrochemical fabrication of CdS nanowire arrays in porous anodic aluminum oxide templates[J].Journal of Physical Chemistry,1996,100(33):14037-14047.
[10] Vrublevsky I;Parkoun V;Schreckenbach J .Analysis of porous oxide film growth on aluminum in phosphoric acid using re-anodizing technique[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(3/4):333-338.
[11] I. Vrublevsky;V. Parkoun;J. Schreckenbach;G. Marx .Study of porous oxide film growth on aluminum in oxalic acid using a re-anodizing technique[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2004(1/4):282-292.
[12] Ono S.;Masuko N. .Evaluation of pore diameter of anodic porous films formed on aluminum[J].Surface & Coatings Technology,2003(0):139-142.
[13] Takahashi H;Nagayama M .The Determination of the Porosity of Anodic Oxide Films on Aluminium by the PoreFilling Method[J].Corrosion Science,1978,18(10):911-925.
[14] Vrublevsky I;Jagminas A;Schreckenbach J;Goedel WA .Electronic properties of electrolyte/anodic alumina junction during porous anodizing[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(10):4680-4687.
[15] Vrublevsky I;Parkoun V;Schreckenbach J;Goedel WA .Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(14):5100-5108.
[16] Laet J D;Scheers J;Terryn H et al.Characterization of aluminium surface treatments with electrochemical impedance spectroscopy and spectroscopic ellipsometry[J].Electrochimica Acta,1993,38(14):2103-2109.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%