采用高真空直流磁控溅射的方法制备了结构为//Ta(5nm)/Co_(75)Fe_(25)(5nm)/Ir_(20)Mn_(80)(12nm)/Ta(8nm)的双层膜,通过X射线衍射(XRD)、原子力显微镜(AFM) 和振动样品磁强计(VSM)研究了退火对双层膜的结构及磁性能的影响;并通过样品在反向饱和场下停留不同的时间,研究了退火对双层膜的磁稳定性的影响.结果表明,退火使得IrMn(111)织构减弱,表面/界面粗糙度增大,交换偏置场减小,矫顽力增加,退火降低了双层膜的磁稳定性.
The CoFe/IrMn bilayer was deposited by high vacuum magnetron sputtering on a silicon wafer substrate.The influences of annealing on texture and magnetic properties were investigated by X-ray diffraction (XRD),atomic force microscopy (AFM) and vibrating sample magnetometry (VSM).And the magnetic stability of both as-prepared and annealed CoFe/IrMn bilayers has been investigated by means of holding the film in a negative saturation field.The results show that the texture of IrMn(111)weakens and the surface/interface roughness increases after annealing,meanwhile,the exchange bias decreases and coercivity increases.Furthermore,the magnetic stability decreases after annealing.
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