由于具有较低的电阻率和成本、较好的机械加工性能、设计上的灵活性,可室温沉积等优点,银基透明导电多层膜已广泛应用于低辐射膜、强电磁屏蔽、低功耗光电子器件特别是柔性电子器件等领域.但由于材料自身的性质与制备条件的差异性,实际制备的金属/电介质(或半导体)透明导电多层膜界面处往往存在表面等离子体共振、界面导电电子散射、膜层脱层开裂等问题,这些均与多层膜界面特性密切相关.本文针对这类问题,评述了近年来银基透明导电多层膜界面研究的进展,并对今后发展给予分析和展望.
参考文献
[1] | 蔡殉;王振国.[J].功能材料,2004(增刊 35):76-82. |
[2] | Dinley D S;Hosono H;Paine D C.Handbook of Transparent Conductors[M].New York:Springer-Verlag,2010 |
[3] | Gregory J. Exarhos;Xiao-Dong Zhou .Discovery-based design of transparent conducting oxide films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2007(18):7025-7052. |
[4] | Bellingham J R;Phillips W A;Adkins C J .[J].Journal of Materials Science Letters,1992,11(05):263-265. |
[5] | Lewis J;Grego S;Chalamala B;Vick E;Temple D .Highly flexible transparent electrodes for organic light-emitting diode-based displays[J].Applied physics letters,2004(16):3450-3452. |
[6] | Fahland M;Vogt T;Schoenberger W et al.[J].THIN SOLID FILMS,2008,516:5777-5780. |
[7] | Berning P H;Turner A F .[J].Journal of the Optical Society of America,1957,47(03):230-239. |
[8] | Scalora M.;Pethel AS.;Dowling JP.;Bowden CM.;Manka AS.;Bloemer MJ. .Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures[J].Journal of Applied Physics,1998(5):2377-2383. |
[9] | Choi Y K;Ha Y K;Kim J E et al.[J].Optics Communications,2004,230:239-243. |
[10] | Lou J;Bao M;Weng H M et al.[J].Journal of Optics A:Pure and Applied Optics,2009,11:085501. |
[11] | Ridealgh J A .[J].Materials Research Society Symposium Proceedings,2006,890:0890-Y01-10.1-10.15. |
[12] | Dobrowolski JA.;Kemp RA.;Li L. .METAL/DIELECTRIC TRANSMISSION INTERFERENCE FILTERS WITH LOW REFLECTANCE .1. DESIGN[J].Applied optics,1995(25):5673-5683. |
[13] | Sullivan B T;Byrt K L .[J].Applied Optics,1995,34(25):5683-5693. |
[14] | Gadsdon, MR;Parsons, J;Sambles, JR .Electromagnetic resonances of a multilayer metal-dielectric stack[J].Journal of the Optical Society of America, B. Optical Physics,2009(4):734-742. |
[15] | Wang YC;Yang SH;Lue JT .The finite difference time domain calculation of one-dimensional photonic crystals composed of repetitive metallic and dielectric layers[J].Applied physics, B. Lasers and optics,2007(3):425-432. |
[16] | Effects of interface roughness on the spectral properties of thin films and multilayers[J].Applied optics,2003(25):5140-5148. |
[17] | Raether H.Surface Plasmons on Smooth and Rough Surfaces and on gratings[M].Beilin:Springer-Verlag,1986 |
[18] | Lue J T;Hor Y S .[J].Journal of the Optical Society of America B:Optical Crystal Physics,1989,6(06):1103-1105. |
[19] | 杨光,陈正豪.脉冲激光沉积Ag:BaTiO3纳米复合薄膜及其光学特性[J].物理学报,2006(08):4342-4346. |
[20] | Masetti E;Bulir J;Gagliardi S;Janicki V;Krasilnikova A;Di Santo G;Coluzza C .Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2004(0):468-472. |
[21] | Tachibana Y.;Kusunoki K.;Watanabe T.;Hashimoto K.;Ohsaki H. .Optical properties of multilayers composed of silver and dielectric materials[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):212-216. |
[22] | von Blackenhagen B;Tonova D.[J].Proceedings of SHE,2005:596317. |
[23] | Dykhne A M;Sarychev A K;Shalaev V M .[J].Physical Review B,2003,67:195402. |
[24] | Dmitruk NL;Korovin AV .Generalized analytical model for the calculation of light transmittance through a thin conducting film[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1/2):382-388. |
[25] | Baumeier B;Leskova T A;Maradudin A A .[J].Journal of Optics A:Pure and Applied Optics,2006,8:S191一S207. |
[26] | Wang P;Zhang D;Kim D H et al.[J].Journal of Applied Physics,2009,106(10):103104. |
[27] | Maaroof A I;Smith G B .[J].THIN SOLID FILMS,2005,485(1-2):198-206. |
[28] | Jaksic Z;Maksimoivc M;Sarajlic M et al.[J].Acta Physica Polonica,2007,112(05):953-958. |
[29] | Hyun-Jin Cho;Kyung-Woo Park;Jun-Ku Ahn .Nanoscale Silver-Based Al-Doped ZnO Multilayer Transparent-Conductive Oxide Films[J].Journal of the Electrochemical Society,2009(8):J215-J220. |
[30] | Feng S;Elson J M;Overfeh P L T .[J].Physical Review B,2005,72:085117. |
[31] | Feng S;Haherman K;Overfelt P L et al.[J].Applied Physics A:Materials Science and Processing,2007,87:235-244. |
[32] | Wang Y.;Xu B.;Zheng WM.;Zhang RJ.;Qian DL.;Zhou SM.;Zheng YX.;Dai N.;Yang YM.;Ding KB.;Zhang XM.;Chen LY. .The medium-related optical constants of noble metals observed by ellipsometric study[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(0):232-236. |
[33] | Ulrich S;Pflug A;Schiffmann K et al.[J].Physica Status Solidi C,2008,5(05):1235-1239. |
[34] | Bennink R S;Yoon Y K;Boyd R W et al.[J].Optics Letters,1999,24(20):1416-1418. |
[35] | Husakou A;Herrmann J .[J].Physical Review Letters,2007,99:127402. |
[36] | Owens D T;Fuentes-Hernandez C;Hales J M et al.[J].Optics Express,2010,18(08):19101-19113. |
[37] | Martin E J J;Yan M;Lane M et al.[J].THIN SOLID FILMS,2004,461:309-315. |
[38] | Fukuda, K;Lim, SHN;Anders, A .Coalescence of magnetron-sputtered silver islands affected by transition metal seeding (Ni, Cr, Nb, Zr, Mo, W, Ta) and other parameters[J].Thin Solid Films,2008(14):4546-4552. |
[39] | Romanyuk A;Steiner R;Mathys D et al.[J].Surface Science,2008,602(09):L49-L52. |
[40] | Vj L;Kobayashi NP;Islam MS;Wu W;Chaturvedi P;Fang NX;Wang SY;Williams RS .Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer[J].Nano letters,2009(1):178-182. |
[41] | Chen W;Thoreson M D;Ishii S et al.[J].Optics Express,2010,18(05):5124-5134. |
[42] | Liu, H.;Wang, B.;Leong, E.S.P.;Yang, P.;Zong, Y.;Si, G.;Teng, J.;Maier, S.A. .Enhanced surface plasmon resonance on a smooth silver film with a seed growth layer[J].ACS nano,2010(6):3139-3146. |
[43] | Vrijmoeth J;van der Vegt H A;Meyer J A et al.[J].Physical Review Letters,1994,72:3843-3846. |
[44] | Zhang Z;Lagally M G .[J].Physical Review Letters,1994,72(05):693-696. |
[45] | Han H;Theodore N D;Alford T L .[J].Journal of Applied Physics,2008,103(01):O13708. |
[46] | Szczyrbowski J;Brauer G;Ruske M et al.[J].THIN SOLID FILMS,1999,351:254-259. |
[47] | Dannenberg R;Glenn D;Staeh E.[A].,2001 |
[48] | Arbab M .[J].THIN SOLID FILMS,2001,381:15-21. |
[49] | Oyama T.;Maekawa M.;Yanagisawa T. .Effects of starting material of aluminum doped zinc oxide underlayer on the electric properties of palladium doped silver film[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2003(4):1389-1392. |
[50] | Tsuda Y;Omoto H;Tanaka K;Ohsaki H .The underlayer effects on the electrical resistivity of Ag thin film[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):223-227. |
[51] | Kato K;Omoto H;Takamatsu A .[J].VACUUM,2009,83(03):606-609. |
[52] | Sivaramakrishnan K;Ngo A T;Lyer S et al.[J].Journal of Applied Physics,2009,105:063525. |
[53] | YUFENG DONG;L.J. BRILLSON .First-Principles Studies of Metal (111)/ZnO{0001} Interfaces[J].Journal of Electronic Materials,2008(5):743-748. |
[54] | Lin Z;Bristowe P D .[J].Physical Review B,2007,75(20):205423. |
[55] | Thompson C V;Carel R .[J].Materials Science and Engineering B:Solid-state materials for advanced technology,1995,32:211-219. |
[56] | Li Z L;Xu H B;Gong S K .[J].Journal of Physical Chemistry B,2004,108(39):15165-15171. |
[57] | Soss S R;Gittleman B;Mello K E et al.[J].Materials Research Society Symposium Proceedings,1996,403:633-638. |
[58] | Birkholz M;Selle B;Fenske F et al.[J].Physical Review B,2003,68(20):205414. |
[59] | Kajikawa Y .Texture development of non-epitaxial polycrystalline ZnO films[J].Journal of Crystal Growth,2006(1):387-394. |
[60] | Kim YS;Park JH;Choi DH;Jang HS;Lee JH;Park HJ;Choi JI;Ju DH;Lee JY;Kim D .ITO/AuATO multilayer thin films for transparent conducting electrode applications[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(5):1524-1527. |
[61] | Fuks D.;Kotomin EA.;Zhukovskii YE.;Stoneham AM.;Dorfman S. .Theoretical analysis of the growth mode for thin metallic films on oxide substrates[J].Physical review letters,2000(20):4333-4336. |
[62] | Pelliccione M;Lu T M.Evolution of Thin Film Morphology[M].Beilin:Springer-Verlag,2008 |
[63] | Ohring M.Materials Science of Thin Films 2nd version[M].Singapore:Elsevier,2001 |
[64] | 詹倩,于荣,贺连龙,李斗星,郭晓楠.低辐射薄膜TiO2-Ag-TiO2-siO的纳米尺度显微结构[J].金属学报,2001(04):337-339. |
[65] | Eisenhammer T;Muggenthaler F .[J].Proceedings of Spie,1994,2255:508-518. |
[66] | Spaepen F .[J].Acta Materialia,2000,48:31-42. |
[67] | Catlow C R A;French S A;Sokol A A et al.[J].Faraday Discussions,2003,124:185-203. |
[68] | Ando, E;Miyazaki, M .Durability of doped zinc oxide/silver/doped zinc oxide low emissivity coatings in humid environment[J].Thin Solid Films,2008(14):4574-4577. |
[69] | Lin Z;Bristowe P D .[J].Journal of Applied Physics,2007,102(10):10351. |
[70] | Lin Z;Bristowe P D .[J].Journal of Applied Physics,2009,106(01):013520. |
[71] | Chen J;Bull S J .[J].THIN SOLID FILMS,2009,517:3704-3711. |
[72] | Chen J;Lin Z;Bull S J .[J].Journal of Physics D: Applied Physics,2009,42:214003. |
[73] | Barthel E;KeDan O;Nael P et al.[J].THIN SOLID FILMS,2008,473:272-277. |
[74] | Phillips, CL;Bristowe, PD .First principles study of the adhesion asymmetry of a metal/oxide interface[J].Journal of Materials Science,2008(11):3960-3968. |
[75] | Mittal K L;Rimai D S;Demojo L P.Fundamentals of Adhension and Interfaces[M].Utrecht:VSP,1995 |
[76] | Zhang W.;Smith JR. .Nonstoichiometric interfaces and Al2O3 adhesion with Al and Ag[J].Physical review letters,2000(15):3225-3228. |
[77] | Kuroda A;Satoh R;Twata Y et al.[J].IEEE Transactions on Components and Packaging Technologies,2007,30(02):302-308. |
[78] | Russell SW.;Spreitzer RL.;Li J.;Moinpour M.;Moghadam F. Alford TL.;Rafalski SA. .ENHANCED ADHESION OF COPPER TO DIELECTRICS VIA TITANIUM AND CHROMIUM ADDITIONS AND SACRIFICIAL REACTIONS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1995(1/2):154-167. |
[79] | Wu TM;Tong JZ;Hsieh JHJ;Sen Yang Y .Improvement of interfacial adhesion of Al/Cr films deposited on indium tin oxide coated glasses by interfacial oxidation[J].Surface & Coatings Technology,2004(1):89-95. |
[80] | 金炯,王德苗,董树荣.低辐射薄膜的研究进展[J].材料导报,2004(10):14-17. |
[81] | Roh HS;Kim GH;Lee WJ .Effects of Added Metallic Elements in Ag-Alloys on Properties of Indium-Tin-Oxide/Ag-Alloy/Indium-Tin-Oxide Transparent Conductive Multilayer System[J].Japanese journal of applied physics,2008(8 Pt.1):6337-6342. |
[82] | Ando E;Suzuki S;Aomine N et al.[J].VACUUM,2000,59(2-3):792-799. |
[83] | Chen S W;Koo C H .[J].Materials Letters,2007,61:4097-4099. |
[84] | Zoo Y;Han H;Alford T L .[J].Journal of Applied Physics,2007,102(08):083548. |
[85] | Kusano E;Kawaguchi J;Enjouji K .[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1986,4(06):2907-2910. |
[86] | Wang Z;Cai X;Chen Q et al.[J].THIN SOLID FILMS,2007,515:3146-3150. |
[87] | Lee J H;Hwangbo C K .[J].Journal of the Korean Physical Society,2005,46:S154-S158. |
[88] | Martín-Palma R J;Martinez-Duart J M .[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1999,17(06):3449-3451. |
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