用直流等离子体增强化学气相沉积设备在不锈钢表面沉积纳米晶TiN和纳米非晶TiN+Si3N4复相薄膜。主要研究了氧元素对薄膜硬度的影响。结果表明,薄膜中极其微量的氧含量就会使nc－TiN + a－Si3N4薄膜的硬度大幅降低。薄膜中氧含量小于0.2%(原子分数)，薄膜硬度可以达到45—55 GPa，而氧含量升至1%—1.5%后，薄膜硬度降至30 GPa左右。其原因与晶界处形成SiOx相有关。
Using direct current plasma enhanced chemical vapor deposition (PCVD) techniques, the nanocomposite films of nc-TiN + a-Si3N4 were synthesized. The detrimental effects of residual oxygen on the films hardness were explored. A minor content of residual oxygen can strongly decrease the hardness of the superhard film. Oxygen impurity of 1%-1.5% (atomic fraction) can make the hardness of film decrease to about 30 GPa as compared to 45-55 GPa for the film with below 0.2% oxygen, which is related to the formation of SiOx at interface of crystalline.
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