通过磁控溅射法在硅基材上制备了不同基底温度的TaMo和TaMoN涂层,采用原子力显微镜(AFM)和X射线衍射仪(XRD)研究了在第三组元N加入的情况下TaMo涂层的表面形貌和组织结构,采用CHI电化学分析仪分析了涂层的耐腐蚀性能,并分别对涂层进行了1000℃+300h高温氧化性能试验.实验结果表明,两种基底温度工艺下氮元素的加入对TaMo涂层的组织结构和表面形貌均有显著影响.另外,氮元素的加入可以提高TaMo涂层的耐腐蚀性能,但对TaMo涂层的耐高温性能没有改善.
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