ZnO是一种新型的I-Ⅵ族半导体材料,目前已研究开发了许多ZnO薄膜的生长技术.其中,磁控溅射、喷雾热分解、分子束外延、激光脉冲沉积、金属有机物化学气相外延等沉积技术得到了有效应用;而一些新的工艺方法,如溶胶-凝胶、原子层处延、化学浴沉积、离子吸附成膜、离子束辅助沉积、薄膜氧化等也进行了深入研究.详细阐述了ZnO薄膜生长技术的最新研究进展.
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