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采用化学镀的方法在高锰铝青铜表面制备了Ni-P镀层。通过扫描电镜、能谱分析观察分析了镀层微观形貌与成分,研究了阴极极化对镀层及表面沉积膜的影响,探讨了高锰铝青铜表面Ni-P镀层与阴极保护的相容性。结果表明,Ni-P镀层使高锰铝青铜维持-0.85V(CSE)极化所需的电流密度降低了1/2;表面沉积膜以CaCO3为主,极化电位越负,其形成的速度越快且颗粒越细小;适宜的阴极保护电位范围内,阴极极化对镀层无不良影响;高锰铝青铜表面Ni—P镀层和阴极保护具有良好的相容性。

Ni-P coating was prepared on the surface of Mn-Al bronze by chemical-plating method. The morphology and composition of Ni-P coating were studied by SEM and EDAX. The effects of cathodic polarization potential on the coating and deposit film were investigated. The compatibility of Ni-P coating with cathodic protection of Mn-Albronze was discussed. The results showed that the current for the same polarization potential decreased by coating. The main composition of the deposit film was CaCO3. The deposit layer formed more rapidly and finer at more negative potentials. There was no adverse effect of cathodic polarization on Ni-P coating when the protective potential range was from -0. 85 V to -1.05 V(CSE). Ni-P coating and cathodic protection of Mn-Al bronze exhibited good compatibility.

参考文献

[1] 刘成龙,林英英,王玥霁,黄伟九.金属材料表面抗空蚀涂层的研究进展[J].材料导报,2011(01):127-131.
[2] 税毅.Ni-P镀层研究现状及发展趋势[J].表面技术,2002(01):1-4,11.
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