铈基、硅基半导体抛光液的发展概况

稀土, 2013, 34(2): 68-73.

铈基、硅基半导体抛光液的发展概况

张立业 ^1, , 张忠义 ^2, , 赵增祺 ^3, , 慕利娟 ^4,

1.内蒙古科技大学材料与冶金工程学院,内蒙古包头014010;包头稀土研究院,内蒙古包头014030

2.包头稀土研究院,内蒙古包头014030

3.内蒙古科技大学材料与冶金工程学院,内蒙古包头014010;包头稀土研究院,内蒙古包头014030;内蒙古工业大学材料科学与工程学院,内蒙古呼和浩特010051

4.内蒙古科技大学材料与冶金工程学院,内蒙古包头014010;内蒙古工业大学材料科学与工程学院,内蒙古呼和浩特010051

基金项目: 包头市科技局项目(2011J1004) 国家"863"项目(2010AA03A407) 内蒙古科技厅项目(2010B1658) 内蒙古科技大学创新基金项目(2010NC062)

关键词：化学机械抛光 , CeO2抛光液 , SiO2抛光液

The Developments of Ceria-based and Silicon-based Semiconductor Polishing Solutions

介绍了化学机械抛光液的研究进展和抛光原理,分析了化学机械抛光过程中抛光液的重要作用,阐述了配制化学机械抛光液的两种方法,分析了影响铈基抛光液和硅基抛光液抛光性能的诸多因素.最后指出了抛光液回收再利用的重要性和可行性.

参考文献

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材料期刊网

铈基、硅基半导体抛光液的发展概况

The Developments of Ceria-based and Silicon-based Semiconductor Polishing Solutions

参考文献