利用中频交流反应磁控溅射技术制备TiO2薄膜,利用AES、XRD和SEM分析了制得的TiO2薄膜的成分、结构和表面形貌,并利用多种降解对象研究了TiO2薄膜的光催化降解性能.结果发现:利用Ar/O2混合气体反应溅射纯Ti靶制备的TiO2薄膜符合化学计量比,呈现柱状生长.TiO2薄膜均为锐钛矿相,晶粒随薄膜厚度增加逐渐长大.制得的TiO2薄膜对亚甲基蓝、甲基橙和敌敌畏都具有确实的光催化降解效果,同时具有很好的光催化性能稳定性.
TiO2 thin films were prepared successfully by mid-frequency AC reactive magnetron sputtering technique. AES, SEM and XRD were used to examine the composition, surface morphology and
microstructure of the TiO2 film, respectively. The photocatalytic degradation property of TiO2 film was investigated using methylene blue (MB) and methyl orange (MO) as the degradation object.
The results show that the ratio of O to Ti in the thin film is very close to 2:1. The TiO2 thin film deposited at 250℃ is composed of anatase. TiO2 thin films prepared in this paper can photocatalyticly
degrade MB, MO, and DDVP effectively. The TiO2 thin film after 10 times used no deterioration of photocatalytic activity can be detected.
参考文献
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