为实现电弧离子镀TiSiN薄膜成分可控,通过改变靶的相对电流在304不锈钢表面沉积TiSiN薄膜,采用厚度仪、能谱仪、扫描电镜、X射线衍射仪及摩擦试验研究了其形貌、结构及摩擦性能.结果表明:TiSiN薄膜中Si以非晶态Si3 N4形式存在,抑制了面心立方结构的TiN晶粒生长,形成纳米晶TiN/非晶Si3N4(nc-TiN/α-Si3N4)纳米复合结构;与TiN薄膜相比,TiSiN薄膜具有更平整的表面,Si含量为4.08％(原子分数)时薄膜表面最光滑平整;TiN薄膜的硬度为2 312 HK左右,掺杂Si元素后,由于细晶强化作用,薄膜的硬度显著提高,Si含量为2.76％(原子分数)时达到最大值,约为3 315 HK;进一步增加Si含量,TiSiN薄膜硬度略有下降;TiSiN薄膜的摩擦系数明显低于TiN薄膜,且随着Si含量增加,摩擦系数逐渐变小,在Si含量为2.76％和4.08％(原子分数)时低至0.4左右.
参考文献
| [1] | Jinlong Li;Shihong Zhang;Mingxi Li .Influence of the C_2H_2 flow rate on gradient TiCN films deposited by multi-arc ion plating[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2013(Oct.15):134-144. |
| [2] | Zhao Y H;Lin G Q;Xiao J Q et al.Ti/TiN multilayer thin film deposited by pulse biased arc ion plating[J].Applied Surface Sinence,2011,257:2683-2688. |
| [3] | ZHAO Hui,WANG Xiao-hui,LIU Qiu-lei,CHEN Li-jia,LIU Zheng.Structure and wear resistance of TiN and TiAlN coatings on AZ91 alloy deposited by multi-arc ion plating[J].中国有色金属学报（英文版）,2010(z2):679-682. |
| [4] | Mayrhofer PH;Stoiber M .Thermal stability of superhard Ti-B-N coatings[J].Surface & Coatings Technology,2007(13):6148-6153. |
| [5] | Lee DB.;Lee YC.;Kwon SC.;Kim MH. .High temperature oxidation of TiCrN coatings deposited on a steel substrate by ion plating[J].Surface & Coatings Technology,2001(2/3):232-239. |
| [6] | Endler, I.;H?hn, M.;Schmidt, J.;Scholz, S.;Herrmann, M.;Knaut, M..Ternary and quarternary TiSiN and TiSiCN nanocomposite coatings obtained by Chemical Vapor Deposition[J].Surface & Coatings Technology,2013:133-140. |
| [7] | Nose M.;Deguchi Y.;Mae T.;Honbo E.;Nagae T.;Nogi K. .Influence of sputtering conditions on the structure and properties of Ti-Si-N thin films prepared by r.f.-reactive sputtering[J].Surface & Coatings Technology,2003(0):261-265. |
| [8] | Cheng, YH;Browne, T;Heckerman, B;Meletis, EI .Mechanical and tribological properties of nanocomposite TiSiN coatings[J].Surface & Coatings Technology,2010(14):2123-2129. |
| [9] | Zhang RF;Veprek S .Phase stabilities of self-organized nc-TiN/a-Si3N4 nanocomposites and of Ti1-xSxNy solid solutions studied by ab initio calculation and thermodynamic modeling[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(8):2264-2275. |
| [10] | Bilek M M M;Milne W L .Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon[J].THIN SOLID FILMS,1996,290/291:299-304. |
| [11] | Bendavid A;Martin PJ;Preston EW;Cairney J;Xie ZH;Hoffman M .Deposition of nanocomposite thin films by a hybrid cathodic arc and chemical vapour technique[J].Surface & Coatings Technology,2006(7):4139-4144. |
| [12] | Martin PJ.;Bendavid A. .Properties of Ti1-xSixNy films deposited by concurrent cathodic arc evaporation and magnetron sputtering[J].Surface & Coatings Technology,2003(0):245-250. |
| [13] | Kim D G;Svadkovski I;Lee S et al.Synthesis Ti-Si-N nanocomposite coating prepared by a hybrid system of double bending flltered vacuum arc source and magnetron sputtering[J].Curr Appl Phy,2009,9(03):179-181. |
| [14] | 张钧 .采用多弧离子镀制备合金涂层的方法[P].中国,CN1057347 B,2000-10-11. |
| [15] | 张晨辉,雒建斌,李文治,陈大融.TiN和Ti1-xSixNy薄膜的微观结构分析[J].物理学报,2004(01):182-188. |
| [16] | Boxman R L;Goldsmith S .Macroparticle contamination in cathodic arc coatings:generation,transport and control[J].Surface and Coatings Technology,1992,52:39-50. |
| [17] | Camps I;Muh1 S;Camps E et al.Tribological properties of TiSiN thin films deposited by laser ablation[J].Surface and Coatings Technology,2014,255:74-78. |
| [18] | Wiklund U.;Larsson M.;Hogmark S.;Wanstrand O. .Evaluation of new multilayered physical vapour deposition coatings in sliding contact[J].Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear,1999(1):88-95. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%