电泳沉积制备氧化钇稳定的二氧化锆薄膜

材料研究学报, 2009, 23(1): 108-112.

电泳沉积制备氧化钇稳定的二氧化锆薄膜

王振华孙克宁沈哲敏沈水云张乃庆

1.1.哈尔滨工业大学应用化学系哈尔滨 1500012.哈尔滨工业大学基础与交叉科学研究院哈尔滨 150001>

1.1.Department of Applied Chemistry

Harbin Institute of Technology

Harbin 500012.Academy of Fundamental and Interdisciplinary Sciences

Harbin Institute of Technology

Harbin 150001>

基金项目: 国家自然科学基金90510006及黑龙江省自然科学基金ZJG0703资助项目.

关键词：无机非金属材料 , electrophoretic deposition , film , yttria-stabilized zirconia (YSZ)

Preparation of yttria-stabilized zirconia (YSZ) films by an electrophoretic deposition method

WANG Zhenhua SUN Kening SHEN Zhemin SHEN Shuiyun ZHANG Naiqing

Keywords： inorganic non-metallic materials , 电泳沉积 , 薄膜 , 钇稳定的二氧化锆

采用恒压电泳沉积方法在Ni-YSZ(氧化钇稳定的氧化锆)阳极基体上制备YSZ电解质膜, 研究了悬浮体系YSZ含量、外加电压、沉积时间对电泳过程及YSZ膜层质量的影响. 结果表明, YSZ含量为20 g/L, 沉积电压为10 V, 沉积时间\linebreak 5 min时, 恒压电泳一次即可得到均匀致密的YSZ膜. 膜层与基体结合紧密, 厚度约为10 μm.

Yttria-stabilized zirconia (YSZ) films on Ni/YSZ substrates were prepared by electrophoretic deposition under constant voltage. Effects of YSZ content, applied voltage and deposition time on electrophoretic processes and YSZ film properties were investigated. Results showed that dense YSZ films can be obtained when 20 g/L YSZ suspension was used and a deposition voltage of 10 V was applied for 5 min. YSZ film contacts with anode substrate compactly with a thickness of 10 μm.

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