铁磁形状记忆合金(FSMA)是一种新型智能材料,Ni-Mn-Ga合金是这种材料的典型代表.使用直流磁控溅射方法在NaCl晶片上制备出Ni-Mn-Ga薄膜,并对影响其制备的主要参数--溅射功率进行了探讨.通过对Ni-Mn-Ga薄膜的成分和薄膜表面性质的分析,得知22.5W为其制备的最佳功率.
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