欢迎登录材料期刊网

材料期刊网

高级检索

The vertical and lateral interactions in a multisheet array of InAs/GaAs quantum dots are analyzed by finite element method (FEM). It is shown that due to the effects of vertical interaction, nucleation prefers to happen above buried quantum dots (QDs). Mearwhile, the effects of lateral interaction adjust the spacing of lateral neighboring QDs. The vertical coupling becomes strong with deceasing GaAs spacer height and increasing number of buried layers, while the lateral coupling becomes strong with increasing InAs wetting layer thickness. The phenomenon that, after successive layers, the spacing and size of QDs islands become progressively more uniform is explained according to the minimum potential energy theory.

参考文献

[1] I.C.Robin;R.Andre;C.Bougerol;T.Aichele and S.Tatarenkoa .[J].AppJ Phys Lett,2006,88:233103.
[2] G.R.Liu;S.S.Quek Jerry .A finite element study of the stress and strain fields of InAs quantum dots embedded in GaAs[J].Semiconductor Science and Technology,2002(6):630-643.
[3] T.Benabbas;Y.Androussi;A.Lefebvre .[J].Journal of Applied Physics,1999,86:1945.
[4] G.Muralidharan .[J].Japanese Journal of Applied Physics,2000,39:L658.
[5] B.L.Liang;Zh.M.Wang;Yu.I.Mazur;G.J.Salamo .[J].Applied Physics Letters,2006,89:043125.
[6] J.Tersoff;C.Teichert;M.G.Lagally .[J].Physical Review Letters,1996,76:10.
[7] Ronald E.Miller;Vijay B.Shenoy .[J].Nanotechnology,2000,11:139.
[8] V.A.Shchukin;D.Bimberg .[J].AppJ Phys A,1998,67:687.
[9] S.M.Wise;J.S.Lowengrub;J.S.Kim;K.Thornton,P.W.Voorhees and W.C.Johnson .[J].Applied Physics Letters,2005,87:133102.
[10] M.DeSeta;G.Capellini;F.Evangelisti .[J].Physical Review B,2005,71:115308.
[11] S.Kiravittaya;H.Heidemeyer;O.Schmidt .[J].Applied Physics Letters,2005,86:263113.
[12] S.S. Quek;G.R. Liu .Simulation of surface evolution of quantum dot using meshfree approximation[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1/2):297-309.
[13] P.Liu;Y.W.Zhang;C.Lu .[J].AppJ Phys Lett,2006,88:041922.
[14] V.A.Shchukin;D.Bimberg .[J].AppJ Phys A,1998,67:687.
[15] B.H.Koo;T.Hanada;H.Makino;T.Yao .[J].Physics Letters,2001,79:4331.
[16] H.She;B.Wang .[J].Semiconductor Science and Technology,2009,24:025002.
[17] H.She;B.Wang.Finite Elements in Analysis & Design[M].,2009
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%