化学溶液沉积法制备涂层导体阻隔层用钨盐前驱体的制备和筛选

材料导报, 2008, 22(z3): 366-368.

化学溶液沉积法制备涂层导体阻隔层用钨盐前驱体的制备和筛选

杨伟波 ^1, , 张国防 ^2, , 马高峰 ^3, , 李成山 ^4, , 阎果 ^5, , 卢亚锋 ^6,

1.陕西师范大学化学与材料科学学院应用表面与胶体化学教育部重点实验室,西安,710062

2.陕西师范大学化学与材料科学学院应用表面与胶体化学教育部重点实验室,西安,710062

3.陕西师范大学化学与材料科学学院应用表面与胶体化学教育部重点实验室,西安,710062

4.西北有色金属研究院,西安,710016

5.西北有色金属研究院,西安,710016

6.西北有色金属研究院,西安,710016

基金项目: 国家高技术研究发展计划(863计划)(2006AA03Z204)

关键词：涂层导体阻隔层 , 化学溶液沉积法 , 钨盐前驱体 , 制备 , 筛选

Preparation and Screening of Tungsten-based Precursors for Buffer Layers of Coated Conductors by Chemical Solution Deposition

制备了[(n-C4H9)4N]2[W6O19]、过氧钨酸衍生物(APTA)和[(n-CBH17)2NH2]2[W4O13]3种有机钨盐,研究了这几种盐在不同溶剂中的溶解性、溶液的稳定性以及在钇稳定氧化锆(YSZ)基片上的润湿性.研究发现:[(n-C8H17)2NH2]2[W4O13]在丙酸中具有溶解性良好、溶液稳定性高及润湿性好的特点,而且与其它金属盐前驱体在丙酸中的配伍性好.因此,选择[(n-C8H17)2NH2]2[W4O13]作为钨盐的前驱体,使我们尝试用化学溶液沉积法制备涂层导体的钨基双钙钛矿薄膜阻隔层成为可能.

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