硅衬底上高增透金刚石膜的制备研究

功能材料, 2009, 40(12): 2008-2010.

硅衬底上高增透金刚石膜的制备研究

王鸿翔 ^1, , 左敦稳 ^2, , 卢文壮 ^3, , 徐峰 ^4,

1.南京航空航天大学,机电学院,江苏,南京,210016;淮安信息职业技术学院,机电工程系,江苏,淮安,223003

2.南京航空航天大学,机电学院,江苏,南京,210016

3.南京航空航天大学,机电学院,江苏,南京,210016

4.南京航空航天大学,机电学院,江苏,南京,210016

基金项目: 江苏省自然科学基金(BK2007193) 国家自然科学基金(50605032)

关键词： HFCVD , 金刚石膜 , 增透

Preparation of anti-reflective diamond film on Si substrate

WANG Hong-xiang ^1, , ZUO Dun-wen ^2, , LU Wen-zhuang ^3, , XU Feng ^4,

1.南京航空航天大学,机电学院,江苏,南京,210016;淮安信息职业技术学院,机电工程系,江苏,淮安,223003

2.南京航空航天大学,机电学院,江苏,南京,210016

3.南京航空航天大学,机电学院,江苏,南京,210016

4.南京航空航天大学,机电学院,江苏,南京,210016

Keywords： HFCVD , diamond film , Anti-reflective

采用甲烷和氢气作为工作气体,在热丝化学气相沉积(HFCVD)设备上采用五段式沉积法制备了金刚石薄膜,用扫描电子显微镜(SEM)、激光拉曼光谱仪、X射线衍射仪(XRD)、原子力显微镜(AFM)以及傅立叶红外光谱仪研究了金刚石膜的结构和性质.结果表明,采用五段式沉积法可以得到晶粒大小达到纳米级的、表面粗糙度较小、金刚石纯度较高的金刚石膜,其最大增透率超过70%,能满足作为光学窗口增透膜的应用要求.

Diamond thin films were prepared using five-stage deposition method in the HFCVD system with methane and hydrogen as the gas source.Structure and character of diamond thin films were measured by SEM,Raman spectrum,XRD,AFM,FTIR.The results show that diamond thin film with nanosized grains,lower surface roughness and higher purity,and the highest IR transmission over 70%,can be obtained adopting five-stage deposition method,and these properties ensure its application of optical window anti-reflective diamond films.

参考文献

[1]	McCarthy KJ;Lopez JG;Rey DJ;Zurro B;Ibarra A;Baciero A;Respaldiza MA .The response of several luminescent materials to keV and MeV ions[J].Journal of Nuclear Materials: Materials Aspects of Fission and Fusion,2005(2/3):291-298.
[2]	W(o)rner M;Wild C;Müller-Sebert W .[J].Diamond and Related Materials,2005,14(3-7):580-583.
[3]	C.M.Liddell;C.J.Summers .Nonspherical ZnS colloidal building blocks for three-dimensional photonic crystals[J].Journal of Colloid and Interface Science,2004(1):103-106.
[4]	Miller A J;Reece D M;Hudson M D .[J].Diamond and Related Materials,1997,6(2-4):386-389.
[5]	Zuo D W;Song S L;Xiang B K et al.[J].Key Engineering Materials,2004,258-259:517-521.
[6]	Zuo D W;Li X F;Wang M et al.[J].Journal of Materials Processing Technology,2003,138:455-457.
[7]	Sun Z;Shi J R;Tay B K.[J].Diamond and Related Materials,2000(09):1979-1983.
[8]	Shardat;Rahamanmm .[J].Diamond and Related Materials,2001,10:561-567.
[9]	施凌云,王林军,蒋丽雯,刘健敏,夏义本.低粗糙度金刚石薄膜的制备及其光学性能的表征[J].上海大学学报（自然科学版）,2007(03):320-324.
[10]	李多生,左敦稳,陈荣发,相炳坤,赵礼刚,王珉.直流等离子体CVD金刚石薄膜微观结构分析[J].稀有金属材料与工程,2007(04):648-651.
[11]	黄元盛,邱万奇,罗承萍.甲烷浓度对CVD金刚石膜表面粗糙度的影响[J].金属热处理,2004(06):15-18.
[12]	苏青峰,刘健敏,王林军,史伟民,夏义本.沉积工艺条件对金刚石薄膜红外椭偏光学性质的影响[J].物理学报,2006(10):5145-5149.
[13]	宋贵宏,宫骏,孙超,黄荣芳,闻立时.HFCVD金刚石膜的形貌对红外透射率的影响[J].人工晶体学报,2000(04):390-393.

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