介绍了现阶段两种用于聚焦离子束系统的离子源——液态金属离子源和气体场发射离子源的基本原理,并对比了它们的优缺点。由于目前这两种离子源都难以满足纳米加工领域不断提高的技术要求,因此提出了一种用于聚焦离子束的新型离子源——电子束离子源,并介绍了电子束离子源的基本原理,给出了设计参数、模拟结果（20kV的Ar＋离子束,发射度约为5.8×10-5π.mm.mrad,束斑约为1μm）和初步的实验结果。
There are two kinds of ion sources,Liquid-Metal Ion Source and Gas Field Ion Source,used to provide ion beams for the Focus Ion Beam system.The working mechanism of the two kinds of sources is presented and their advantages and disadvantages are summarized.With the rapid development in the nano technology,the requirements are hardly met with these two kinds of ion sources.Therefore,a new kind of ion source,electron beam ion source,is developed for the Focus Ion Beam system.The basic principle of the electron beam ion source is introduced and the design parameters,the result of the simulation（20 kV Ar＋,extracted emittance is 5.8×10-5π·mm·mrad,raduis of the ion beam about 1 μm.） and the primary experimental results are presented.
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