本文研究了氩等离子体处理对ZnO薄膜阻变效应的影响,发现等离子体处理可以使薄膜表面平整,并且增加薄膜中的缺陷浓度.以等离子体处理后的ZnO薄膜作为介质层,在Pt/ZnO/Pt三明治结构中观察到无电形成过程的阻变效应.本文研究表明,氩等离子体处理是消除氧化物阻变效应电形成过程的有效手段.
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