制备了一种含有特殊光聚合单体、聚醚、交联剂和光引发剂的新型光学记录材料,该材料具有光聚合诱导相分离的特性,经紫外曝光后能呈现透过率较低的浑浊态.在掩膜下对该材料进行紫外曝光、显影后可以实现对掩膜图案的光学记录,并详细探讨了影响记录性能、收缩率以及稳定性的因素.该光学记录材料的出现将为光学记录提供新的发展空间.
A novel optical recording material composed of a special photopolymerizable monomer, polyether, crosslinking agent, and photoinitiator is prepared. This material shows a phase separation induced by photopolymeri-zation, and exhibits an opaque state of low transmittance by UV exposure. Optical recording for mask pattern can be performed by exposing this material to UV irradiation under a mask. Influences on recording properties, shrinkage ratio, and stability are discussed. This material offers new development opportunity for optical materials.
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