铜酞菁缓冲层改善有机电致发光器件性能的机理研究

功能材料, 2002, 33(3): 321-323.

1.清华大学化学系,北京,100084

2.清华大学化学系,北京,100084

3.清华大学化学系,北京,100084

4.清华大学化学系,北京,100084

5.清华大学化学系,北京,100084

基金项目: 国家自然科学基金(59790050-08)

Mechanism of improving the performance of organic electroluminescent divices by using CuPc as buffer layer

利用铜酞菁薄膜充当缓冲层,研究了缓冲层对有机电致发光器件性能的影响,研究结果表明含有铜酞菁缓冲层的器件性能明显优于不含有缓冲层的器件,加入铜酞菁缓冲层后器件发光稳定性也得到了改善.本文对相关机理进行了探讨,分析认为,铜酞菁本身的热稳定性和它能够降低空穴注入势垒的性质是提高器件性能的主要原因.

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