在室温(290 K)和低温(25 K)下,测量了从11～40 kV的一系列管电压下X射线激发纯CsI和CsI (Tl)晶体的辐照致发光(RL)谱.结果表明:在固定温度下,管电压变化后, 305 nm和340 nm的本征发光带和580 nm的非本征发光带的形状结构均不发生变化,只是其强度发生变化.对所测得的各发光带强度随管电压的变化关系用抛物线模型进行了拟合分析,得到了较好的结果.同时还发现纯CsI和CsI (Tl)晶体中所有本征RL发光带强度与X射线强度基本上成正比关系,而当管电压增加时,CsI (Tl)晶体中非本征发光带强度的增加速度慢于本征发光带.分析认为,290 K时这可能与样品中另一个位于400 nm左右的发光带有关;而在25 K时则可能和H心与VK心的竞争有关.
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