Ta_2O_5薄膜具有很好的电学性能和光学性能,制备方法种类繁多,如溶胶-凝胶法(Sol-gel)、化学气相沉积法、电子束蒸发技术、溅射法、Ta层阳极氧化或热氧化法、离子辅助沉积法(IBAD)、原子层沉积法(ALD)等.评述了现有各种制备方法的优缺点,综述了Ta_2O_5薄膜各种方法制备的条件、薄膜的功能性质等,并评析了金属有机化合物为前驱体制备性能优良的Ta_2O_5薄膜的前景.
Ta_2O_5 films possess good electrics properties and optics properties. Currently, the preparation methods are classified as sol-gel,CVD,ALD and so on, the merits and demerits of those methods are discussed, the controlling conditions of these fabrication methods and the as-synthesized film's properties are summarized. Finally, theprospect of using the metal-organic compound as precursor to prepare excellent performance Ta_2O_5 films is also introduced.
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