在氧化钒薄膜的直流磁控溅射制备中,氩流量是影响沉膜工艺以及薄膜织构和性能的重要因素之一.从氧化钒薄膜制备角度出发,研究了纯氩环境以及氧流量恒定的氩氧混合环境中溅射电压和薄膜沉积速率随氩流量的变化.实验结果有助于对氧化钒薄膜制备工艺进行优化,为氩气流量的选择提供参考.
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