高熵合金氮化物薄膜性能优异,目前国内对Al0.3CrFe1.5MnNi0.5高熵合金的研究主要是对块体,对薄膜研究较少.采用直流磁控溅射技术在硅片上沉积了Al0.3CrFe1.5MnNi0.5高熵合金氮化物薄膜.利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、纳米压痕仪等分析了基板偏压对薄膜的晶体结构、溅射效率、硬度和摩擦磨损性能的影响.结果表明:基板偏压为-50 V时,薄膜的晶体结构为面心立方结构(FCC),薄膜截面有明显的柱状结构;随着偏压幅值的增加,衍射峰的强度降低,晶粒尺寸减小,薄膜的溅射效率降低,硬度提高;基板偏压为-150 V时薄膜硬度最高,为13.74 GPa,此时薄膜的抗摩擦磨损性能最好.
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